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- [[:Category:I|I]]30 KB (2,955 words) - 07:30, 24 February 2020
- ...on the 1998 Feynman Prize in Nanotechnology for theory. Robert Freitas and I have formed the Nanofactory Collaboration. ...me, was named an IACR Fellow and a Fellow of the Computer History Museum). I also invented Merkle signatures, based on Merkle trees. Michael Szydlo deve2 KB (348 words) - 22:13, 5 March 2017
- ...direct tutelage of Dr Max Knoll and together with other doctoral students I worked on the development of a high performance cathode ray oscilloscope. O ...niversity teaching thesis (1944), both at the Technical College in Berlin, I investigated the properties of electron lenses with short focal lengths.5 KB (815 words) - 22:28, 5 March 2017
- ...For example equation in Ms Word Math is <math>\frac{\mathrm d}{\mathrm d x}I(x)=-\alpha cI(x)\tag {1}</math> ...in-right: -0.125em;">e</span>X</span> code is \frac{\mathrm d}{\mathrm d x}I(x)=-\alpha cI(x)\tag {1}.16 KB (2,364 words) - 21:44, 19 February 2020
- ...For example equation in Ms Word Math is <math>\frac{\mathrm d}{\mathrm d x}I(x)=-\alpha cI(x)\tag {1}</math> ...in-right: -0.125em;">e</span>X</span> code is \frac{\mathrm d}{\mathrm d x}I(x)=-\alpha cI(x)\tag {1}.11 KB (1,690 words) - 17:05, 10 February 2020
- (i) between the ExBIPY2+ unit and the DAPP2+ unit (π···π distance of 3.76 KB (817 words) - 18:35, 25 May 2017
- ''<u>N</u>ano<u>I</u>mprint <u>L</u>ithography (henceforth NIL) is a high throughput, high-re ...be removed before the film can be used as a resist for pattern transfer, ''i.e.'', the conversion of the resist topography into a different material, by34 KB (5,248 words) - 21:40, 19 February 2020
- ...nopattern formation mechanisms, it can be categorized into three schemas: (i) the material transfer, (ii) material change, and (iii) material removal. F22 KB (3,076 words) - 21:39, 19 February 2020
- 20 KB (2,981 words) - 05:00, 17 October 2018
