Difference between revisions of "A Review of Tip-based Nanofabrication"
From Nanopedia
Line 8: | Line 8: | ||
__TOC__ | __TOC__ | ||
==Introduction== | ==Introduction== | ||
+ | |||
+ | {| class="wikitable" | ||
+ | ! style="text-align: center; font-size:large; font-family:'Times New Roman', Times, serif !important;; background-color:#34cdf9;" | TBN | ||
+ | technology | ||
+ | ! style="text-align: center; font-size:large; background-color:#34cdf9;" | Atom-remove | ||
+ | ! style="text-align: center; font-size:large; background-color:#34cdf9;" | DPN | ||
+ | ! style="text-align: center; font-size:large; background-color:#34cdf9;" | tDPN | ||
+ | ! style="text-align: center; font-size:large; background-color:#34cdf9;" | Thermal | ||
+ | Mechanical | ||
+ | ! style="text-align: center; font-size:large; background-color:#34cdf9;" | Thermal-chemical | ||
+ | (TCNL) | ||
+ | ! style="text-align: center; font-size:large; background-color:#34cdf9;" | Mechanical | ||
+ | Removal | ||
+ | ! style="text-align: center; font-size:large; background-color:#34cdf9;" | Electro-Chemical | ||
+ | |- | ||
+ | | style="text-align: center; font-size:medium; background-color:#dae8fc;" | Lateral | ||
+ | Resolution | ||
+ | | style="text-align: center;" | Sun 1nm [15] | ||
+ | | style="text-align: center;" | 10 nm [16] | ||
+ | | style="text-align: center;" | 10 nm [17] | ||
+ | | style="text-align: center;" | Sub 20 nm [18] | ||
+ | | style="text-align: center;" | 10 nm [19] | ||
+ | | style="text-align: center;" | 10 nm [20] | ||
+ | | style="text-align: center;" | 4 nm [21] | ||
+ | |- | ||
+ | | style="text-align: center; font-size:medium; background-color:#dae8fc;" | Speed | ||
+ | | style="text-align: center;" | 0.4 - 80 nm/s [22] | ||
+ | | style="text-align: center;" | 0.1 - 4 μm/s [1,23] | ||
+ | | style="text-align: center;" | 0.1 - 200 μm/s [17, 24] | ||
+ | | style="text-align: center;" | 20 mm/s [25] - 1.25 m/s [26] | ||
+ | | style="text-align: center;" | 1 mm/s [19] | ||
+ | | style="text-align: center;" | 0.1 - 40 μm/s [27] | ||
+ | | 0.5 μm/s - 1mm/s [19] | ||
+ | |- | ||
+ | | style="text-align: center; font-size:medium; background-color:#dae8fc;" | Directly | ||
+ | processed | ||
+ | material | ||
+ | types | ||
+ | | style="text-align: center;" | Metal or semiconductors | ||
+ | | style="text-align: center;" | Biological materials & chemicals | ||
+ | | style="text-align: center;" | Polymer | ||
+ | & metals with | ||
+ | low | ||
+ | melting | ||
+ | temperatures | ||
+ | | style="text-align: center;" | Polymer | ||
+ | | style="text-align: center;" | Special polymer resist | ||
+ | | style="text-align: center;" | Metal, semiconductor, | ||
+ | graphene | ||
+ | | style="text-align: center;" | Metal, semiconductor, | ||
+ | graphene | ||
+ | |- | ||
+ | | style="text-align: center; font-size:medium; background-color:#dae8fc;" | Vacumm | ||
+ | | style="text-align: center;" | Ultra-high vacuum | ||
+ | (<10E-9 Torr) | ||
+ | | style="text-align: center;" | No | ||
+ | | style="text-align: center;" | No | ||
+ | | style="text-align: center;" | No | ||
+ | | style="text-align: center;" | No | ||
+ | | style="text-align: center;" | No | ||
+ | | style="text-align: center;" | No | ||
+ | |- | ||
+ | | style="text-align: center; font-size:medium; background-color:#dae8fc;" | Need | ||
+ | Humidity | ||
+ | Control | ||
+ | | style="text-align: center;" | No | ||
+ | | style="text-align: center;" | Yes | ||
+ | | style="text-align: center;" | No | ||
+ | | style="text-align: center;" | No | ||
+ | | style="text-align: center;" | No | ||
+ | | style="text-align: center;" | No | ||
+ | | style="text-align: center;" | Yes | ||
+ | |} |
Revision as of 16:23, 20 August 2018
Huan Hu
ZJU-UIUC Joint Institute, International Campus, Zhejiang University, Haining, Zhejiang 314400, China.
College of Information Science and Electronic Engineering, Zhejiang University, Hangzhou, Zhejiang 310027, China
Contents
Introduction
TBN
technology |
Atom-remove | DPN | tDPN | Thermal
Mechanical |
Thermal-chemical
(TCNL) |
Mechanical
Removal |
Electro-Chemical |
---|---|---|---|---|---|---|---|
Lateral
Resolution |
Sun 1nm [15] | 10 nm [16] | 10 nm [17] | Sub 20 nm [18] | 10 nm [19] | 10 nm [20] | 4 nm [21] |
Speed | 0.4 - 80 nm/s [22] | 0.1 - 4 μm/s [1,23] | 0.1 - 200 μm/s [17, 24] | 20 mm/s [25] - 1.25 m/s [26] | 1 mm/s [19] | 0.1 - 40 μm/s [27] | 0.5 μm/s - 1mm/s [19] |
Directly
processed material types |
Metal or semiconductors | Biological materials & chemicals | Polymer
& metals with low melting temperatures |
Polymer | Special polymer resist | Metal, semiconductor,
graphene |
Metal, semiconductor,
graphene |
Vacumm | Ultra-high vacuum
(<10E-9 Torr) |
No | No | No | No | No | No |
Need
Humidity Control |
No | Yes | No | No | No | No | Yes |